Influences of depostion parameters on the crystallographic orientation of reactively sputtered AlN thin films

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dc.contributor.authorLee, HCko
dc.contributor.authorYong, YJko
dc.contributor.authorLee, Jai Youngko
dc.date.accessioned2013-02-25T09:04:37Z-
dc.date.available2013-02-25T09:04:37Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1994-
dc.identifier.citationEUROPEAN JOURNAL OF SOLID STATE AND INORGANIC CHEMISTRY, v.13, pp.513 - 522-
dc.identifier.issn0992-4361-
dc.identifier.urihttp://hdl.handle.net/10203/61026-
dc.languageEnglish-
dc.publisherElsevie-
dc.titleInfluences of depostion parameters on the crystallographic orientation of reactively sputtered AlN thin films-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume13-
dc.citation.beginningpage513-
dc.citation.endingpage522-
dc.citation.publicationnameEUROPEAN JOURNAL OF SOLID STATE AND INORGANIC CHEMISTRY-
dc.contributor.nonIdAuthorLee, HC-
dc.contributor.nonIdAuthorYong, YJ-
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