Preparation and Deposition Mechanism of Ferroelectric PbTiO3 Thin Films by Chemical Vapor Deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | S.G.Yoon | ko |
| dc.contributor.author | Kim, Ho Gi | ko |
| dc.date.accessioned | 2013-02-25T07:52:38Z | - |
| dc.date.available | 2013-02-25T07:52:38Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1988-12 | - |
| dc.identifier.citation | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.135, no.12, pp.3137 - 3140 | - |
| dc.identifier.issn | 0013-4651 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/60635 | - |
| dc.language | English | - |
| dc.publisher | Electrochemical Soc Inc | - |
| dc.title | Preparation and Deposition Mechanism of Ferroelectric PbTiO3 Thin Films by Chemical Vapor Deposition | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1988R351700046 | - |
| dc.identifier.scopusid | 2-s2.0-0024132634 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 135 | - |
| dc.citation.issue | 12 | - |
| dc.citation.beginningpage | 3137 | - |
| dc.citation.endingpage | 3140 | - |
| dc.citation.publicationname | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
| dc.contributor.localauthor | Kim, Ho Gi | - |
| dc.contributor.nonIdAuthor | S.G.Yoon | - |
| dc.type.journalArticle | Article | - |
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