LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BLANKET TUNGSTEN USING A GASEOUS MIXTURE OF WF6, SIH4, AND H2
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | PARK, HL | ko |
| dc.contributor.author | YOON, SS | ko |
| dc.contributor.author | Park, Chong-Ook | ko |
| dc.contributor.author | Chun , Soung Soon | ko |
| dc.date.accessioned | 2013-02-25T07:21:15Z | - |
| dc.date.available | 2013-02-25T07:21:15Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1989-12 | - |
| dc.identifier.citation | THIN SOLID FILMS, v.181, no.1, pp.85 - 93 | - |
| dc.identifier.issn | 0040-6090 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/60514 | - |
| dc.language | English | - |
| dc.publisher | ELSEVIER SCIENCE SA LAUSANNE | - |
| dc.title | LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BLANKET TUNGSTEN USING A GASEOUS MIXTURE OF WF6, SIH4, AND H2 | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1989CK15400009 | - |
| dc.identifier.scopusid | 2-s2.0-0024946072 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 181 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 85 | - |
| dc.citation.endingpage | 93 | - |
| dc.citation.publicationname | THIN SOLID FILMS | - |
| dc.contributor.localauthor | Park, Chong-Ook | - |
| dc.contributor.localauthor | Chun , Soung Soon | - |
| dc.contributor.nonIdAuthor | PARK, HL | - |
| dc.contributor.nonIdAuthor | YOON, SS | - |
| dc.type.journalArticle | Article | - |
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