ENHANCED PLASMA ETCH RESISTANCE OF ACRYLIC ACID-CALCIUM ACETATE MODIFIED POLY(METHYLMETHACRYLATE)

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dc.contributor.authorCHOI, JOko
dc.contributor.authorKim, Sang Youlko
dc.contributor.authorMOORE, JAko
dc.contributor.authorCORELLI, JCko
dc.contributor.authorSTECKL, AJko
dc.date.accessioned2013-02-25T05:51:31Z-
dc.date.available2013-02-25T05:51:31Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1987-
dc.identifier.citationJOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.5, no.1, pp.382 - 385-
dc.identifier.issn1071-1023-
dc.identifier.urihttp://hdl.handle.net/10203/60385-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleENHANCED PLASMA ETCH RESISTANCE OF ACRYLIC ACID-CALCIUM ACETATE MODIFIED POLY(METHYLMETHACRYLATE)-
dc.typeArticle-
dc.identifier.wosidA1987G053900083-
dc.type.rimsART-
dc.citation.volume5-
dc.citation.issue1-
dc.citation.beginningpage382-
dc.citation.endingpage385-
dc.citation.publicationnameJOURNAL OF VACUUM SCIENCE TECHNOLOGY B-
dc.identifier.doi10.1116/1.583908-
dc.contributor.localauthorKim, Sang Youl-
dc.contributor.nonIdAuthorCHOI, JO-
dc.contributor.nonIdAuthorMOORE, JA-
dc.contributor.nonIdAuthorCORELLI, JC-
dc.contributor.nonIdAuthorSTECKL, AJ-
dc.type.journalArticleArticle-
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CH-Journal Papers(저널논문)
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