Theoretical model and experimental results of PECVD amorphous silicon deposition process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김진홍 | ko |
| dc.contributor.author | 남철우 | ko |
| dc.contributor.author | 우성일 | ko |
| dc.contributor.author | 김용태 | ko |
| dc.date.accessioned | 2013-02-25T00:05:19Z | - |
| dc.date.available | 2013-02-25T00:05:19Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990-01 | - |
| dc.identifier.citation | 전자공학회논문지, v.27, no.6, pp.816 - 1058 | - |
| dc.identifier.issn | 1016-135X | - |
| dc.identifier.uri | http://hdl.handle.net/10203/58271 | - |
| dc.language | Korean | - |
| dc.publisher | 대한전자공학회 | - |
| dc.title | Theoretical model and experimental results of PECVD amorphous silicon deposition process | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 27 | - |
| dc.citation.issue | 6 | - |
| dc.citation.beginningpage | 816 | - |
| dc.citation.endingpage | 1058 | - |
| dc.citation.publicationname | 전자공학회논문지 | - |
| dc.contributor.localauthor | 우성일 | - |
| dc.contributor.nonIdAuthor | 김진홍 | - |
| dc.contributor.nonIdAuthor | 남철우 | - |
| dc.contributor.nonIdAuthor | 김용태 | - |
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