OXYGEN PLASMA EFFECTS ON ELECTRICAL-PROPERTIES OF BARIUM STRONTIUM-TITANATE (BST) THIN-FILMS

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dc.contributor.authorKim, Ho-Giko
dc.contributor.authorLEE, WJko
dc.date.accessioned2013-02-24T14:14:02Z-
dc.date.available2013-02-24T14:14:02Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1995-
dc.identifier.citationINTEGRATED FERROELECTRICS, v.7, no.1-4, pp.207 - 214-
dc.identifier.issn1058-4587-
dc.identifier.urihttp://hdl.handle.net/10203/57757-
dc.description.abstract(Ba0.5Sr0.5)TiO3 thin films have been prepared on Pt/Ta/SiO2/Si substrates by means of a conventional rf magnetron sputtering method with ceramic target and excess BaO, SrO target under various Ar/O-2 plasma conditions. Electric properties of the films have been studied. Increase of O-2 plasma content improve dielectric and insulating properties of the films. An 80nm-BST thin film deposited with 50% O-2 plasma content has a dielectric constant of 446 and a leakage current density of 1.5x10(-7)A/cm(2) at 3V. In the current-voltage curve of BST film deposited with higher O-2 plasma content, a wider saturated region of hopping conduction appeares.-
dc.languageEnglish-
dc.publisherGORDON BREACH SCI PUBL LTD-
dc.titleOXYGEN PLASMA EFFECTS ON ELECTRICAL-PROPERTIES OF BARIUM STRONTIUM-TITANATE (BST) THIN-FILMS-
dc.typeArticle-
dc.identifier.wosidA1995QY49700019-
dc.identifier.scopusid2-s2.0-0004452259-
dc.type.rimsART-
dc.citation.volume7-
dc.citation.issue1-4-
dc.citation.beginningpage207-
dc.citation.endingpage214-
dc.citation.publicationnameINTEGRATED FERROELECTRICS-
dc.identifier.doi10.1080/10584589508220233-
dc.contributor.localauthorKim, Ho-Gi-
dc.contributor.nonIdAuthorLEE, WJ-
dc.type.journalArticleArticle; Proceedings Paper-
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