The Deposition Mechanisms and Microstructures of Tungsten Films Produced by Silicon Reduction of WF6

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dc.contributor.authorPark, Heung Lakko
dc.contributor.authorPark, Chong Doko
dc.contributor.authorChun , Soung Soonko
dc.date.accessioned2013-02-24T11:08:37Z-
dc.date.available2013-02-24T11:08:37Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1988-
dc.identifier.citationTHIN SOLID FILMS, v.166, pp.37 - 43-
dc.identifier.issn0040-6090-
dc.identifier.urihttp://hdl.handle.net/10203/56716-
dc.languageEnglish-
dc.publisherElsevier Science Sa-
dc.titleThe Deposition Mechanisms and Microstructures of Tungsten Films Produced by Silicon Reduction of WF6-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume166-
dc.citation.beginningpage37-
dc.citation.endingpage43-
dc.citation.publicationnameTHIN SOLID FILMS-
dc.contributor.localauthorChun , Soung Soon-
dc.contributor.nonIdAuthorPark, Heung Lak-
dc.contributor.nonIdAuthorPark, Chong Do-
dc.description.isOpenAccessN-
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