The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Chun , Soung Soon | ko |
| dc.date.accessioned | 2013-02-24T10:43:04Z | - |
| dc.date.available | 2013-02-24T10:43:04Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1989-01 | - |
| dc.identifier.citation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.1, pp.31 - 35 | - |
| dc.identifier.issn | 0734-2101 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/56555 | - |
| dc.language | English | - |
| dc.publisher | A V S Amer Inst Physics | - |
| dc.title | The Deposition Rate and Properties of the Deposit in Plasma Enhanced Chemical Vapor Deposition of TiN | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1970F892500007 | - |
| dc.identifier.scopusid | 2-s2.0-84956039607 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 7 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 31 | - |
| dc.citation.endingpage | 35 | - |
| dc.citation.publicationname | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | - |
| dc.identifier.doi | 10.1116/1.1315821 | - |
| dc.contributor.localauthor | Chun , Soung Soon | - |
| dc.type.journalArticle | Article | - |
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