NOISE IN A-SI-H P-I-N DETECTOR DIODES

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dc.contributor.authorCho, Gyuseongko
dc.contributor.authorQURESHI, Sko
dc.contributor.authorDREWERY, JSko
dc.contributor.authorJING, Tko
dc.contributor.authorKAPLAN, SNko
dc.contributor.authorLEE, Hko
dc.contributor.authorMIRESHGHI, Ako
dc.contributor.authorPEREZMENDEZ, Vko
dc.contributor.authorWILDERMUTH, Dko
dc.date.accessioned2013-02-24T09:55:10Z-
dc.date.available2013-02-24T09:55:10Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1992-08-
dc.identifier.citationIEEE TRANSACTIONS ON NUCLEAR SCIENCE, v.39, no.4, pp.641 - 644-
dc.identifier.issn0018-9499-
dc.identifier.urihttp://hdl.handle.net/10203/56237-
dc.description.abstractNoise of a-Si:H p-i-n diodes (5 approximately 50 mum thick) under reverse bias was investigated. The current dependent 1/f type noise was found to be the main noise component at high bias. At low bias the thermal noise from a series resistance of the p-layer and of the metallic contacts is the dominant noise source which is unrelated to the reverse current through the diode. The noise associated with the p-layer resistance decreased significantly on annealing under reverse bias, reducing the total zero bias noise by a factor of 2 approximately. The noise recovered to the original value on subsequent annealing without bias. In addition to the resistive noise these seems to be a shaping time independent noise component at zero biased diodes.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectAMORPHOUS-SILICON-
dc.titleNOISE IN A-SI-H P-I-N DETECTOR DIODES-
dc.typeArticle-
dc.identifier.wosidA1992JR35300027-
dc.identifier.scopusid2-s2.0-0026905270-
dc.type.rimsART-
dc.citation.volume39-
dc.citation.issue4-
dc.citation.beginningpage641-
dc.citation.endingpage644-
dc.citation.publicationnameIEEE TRANSACTIONS ON NUCLEAR SCIENCE-
dc.identifier.doi10.1109/23.159679-
dc.contributor.localauthorCho, Gyuseong-
dc.contributor.nonIdAuthorQURESHI, S-
dc.contributor.nonIdAuthorDREWERY, JS-
dc.contributor.nonIdAuthorJING, T-
dc.contributor.nonIdAuthorKAPLAN, SN-
dc.contributor.nonIdAuthorLEE, H-
dc.contributor.nonIdAuthorMIRESHGHI, A-
dc.contributor.nonIdAuthorPEREZMENDEZ, V-
dc.contributor.nonIdAuthorWILDERMUTH, D-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordPlusAMORPHOUS-SILICON-
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