EFFECT OF DEPOSITION VARIABLES ON THE CHEMICAL VAPOR-DEPOSITION OF TIC USING PROPANE
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | KIM, DG | ko |
| dc.contributor.author | YOO, JS | ko |
| dc.contributor.author | Chun , Soung Soon | ko |
| dc.date.accessioned | 2013-02-24T09:40:15Z | - |
| dc.date.available | 2013-02-24T09:40:15Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1986 | - |
| dc.identifier.citation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.4, no.2, pp.219 - 221 | - |
| dc.identifier.issn | 0734-2101 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/56145 | - |
| dc.language | English | - |
| dc.publisher | A V S AMER INST PHYSICS | - |
| dc.title | EFFECT OF DEPOSITION VARIABLES ON THE CHEMICAL VAPOR-DEPOSITION OF TIC USING PROPANE | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1986A768600012 | - |
| dc.identifier.scopusid | 2-s2.0-3342950876 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 4 | - |
| dc.citation.issue | 2 | - |
| dc.citation.beginningpage | 219 | - |
| dc.citation.endingpage | 221 | - |
| dc.citation.publicationname | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | - |
| dc.identifier.doi | 10.1116/1.573474 | - |
| dc.contributor.localauthor | Chun , Soung Soon | - |
| dc.contributor.nonIdAuthor | KIM, DG | - |
| dc.contributor.nonIdAuthor | YOO, JS | - |
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