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Synthesis of norbornene copolymers with acid labile organosilicon protecting groups and their application as dry-developable photoresists for ArF lithography = 산촉매에 의해 분해되는 유기 실리콘기를 노르보넨 측쇄에 함유하는 공중합체의 합성과 건식현상형 포토레지스트로서의 응용link

Kang, Jae-Sung; 강재성; et al, 한국과학기술원, 2000

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