Browse "Dept. of Chemistry(화학과)" by Author Yun, Hyo-Jin
Showing results 6 to 14 of 14
| Diffusion and surface evaporation of photogenerated acid in basic polymers for PED Stability of ArF chemically amplified resists Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 1999 년도 추계 학술대회, pp.250 - 251, 한국고분자학회, 1999-10 |
| Evaluation of Reactivity Ratios of Monomers in the Copolymerization of t-Butyl 3a-Methacryloyloxy-7a-Dihydroxy-5a-Cholan-24-oate and Maleic Anhydride Kim, Jin-Baek; Ko, Jong-Sung; Lee, Bum Wook; Yun, Hyo-Jin, 한국고분자학회 2000년 춘계학술대회 , pp.68 - 68, 한국고분자학회, 2000 |
| Hindered amine additives for post-exposure delay stability in ArF chemically amplified resists Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Lee, Bum Wook, 한국고분자학회 2000년 춘계학술대회, pp.0 - 0, 한국고분자학회, 2000-04 |
| New Class of Cholate-based Dissolution Inhibitor with Etch Resistance Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Jini; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회 , pp.176 - 176, 한국고분자학회, 2001-10 |
| Novel molecular resists based on inclusion complex of cyclodextrin Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Choi, Jae-Hak, Advances in Resist Technology and Processing XIX, pp.837 - 845, SPIE, 2002-03-04 |
| Photobleachable silicon-containing molecular resist for deep UV lithography Kim, Jin-Baek; Ganesan, Ramakrishnan; Choi, Jae-Hak; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Kyoung-Seon; Oh, Tae-Hwan, JOURNAL OF MATERIALS CHEMISTRY, v.16, no.34, pp.3448 - 3451, 2006 |
| Polymeric and molecular resists for short wavelength lithography = 단파장 리소그라피용 고분자 및 분자 레지스트link Yun, Hyo-Jin; 윤효진; et al, 한국과학기술원, 2002 |
| Silicon Containing Bilayer Resist Lee, Jini; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, 한국고분자학회 2001년 추계학술대회, pp.162 - 162, 한국고분자학회, 2001-10 |
| The effects of functional group on cross-linking and shelf life of resists Yun, Hyo-Jin; Kwon, Young-Gil; Lee, Bum Wook; Kim, Jin-Baek, 한국고분자학회 2000년 춘계학술대회, 한국고분자학회, 2000-04 |
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