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Showing results 1 to 3 of 3

1
Chemical bond structure of a-C:F films with a low dielectric constant deposited from CH4/CF4

gwon-sam kang; ho-jeong; chi-kyu choi; Chang, Choong-Seock, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, no.5, pp.676, 2003

2
Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition

Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; et al, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05

3
SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source

Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07

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