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Showing results 1 to 5 of 5

1
A study on low dielectric material deposition using a helicon plasma source

Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09

2
Anomalous evolution of Ar metastable density with electron density in high density Ar discharge

Park, Min; Chang, Hong-Young; You, Shin-Jae; Kim, Jung-Hyung; Shin, Yong-Hyeon, PHYSICS OF PLASMAS, v.18, no.10, 2011-10

3
Antenna configuration for uniform large-area inductively coupled plasma production

Kim, SS; Chang, Hong-Young; Chang, Choong-Seock; Yoon, NS, APPLIED PHYSICS LETTERS, v.77, no.4, pp.492 - 494, 2000-07

4
Nonlocal electron kinetics in a planar inductive helium discharge

Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11

5
Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source

S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04

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