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Showing results 1 to 12 of 12

1
Development of multiple inductively coupled plasma sources using coaxial transmission line for large-area processes

Lee, Jin-Won; An, Sang-Hyuk; Kim, J. H.; Lee, Yun-Seong; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.16, no.3, pp.415 - 420, 2016-03

2
Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma

You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03

3
Effective design of multiple hollow cathode electrode to enhance the density of rf capacitively coupled plasma

Lee, Hun-Su; Lee, Yun-Seong; Seo, S. H.; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.97, no.8, 2010-08

4
Fast measurement of a pulsed plasma using a Fourier cutoff probe

Na, Byung-Keun; You, Kwang-Ho; Kim, D. -W.; Seo, Byong-Hoon; Chang, Hong-Young; You, S. -J.; Lee, Yun-Seong, JOURNAL OF INSTRUMENTATION, v.7, 2012-04

5
On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08

6
Power dissipation and mode transition in an RF discharge with multi-hollow cathode electrode

Lee, Yun-Seong; Lee, Hun-Su; Chang, Hong-Young, THIN SOLID FILMS, v.518, pp.6682 - 6685, 2010-09

7
Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas

Jun, Hyun-Su; Lee, Yun-Seong; Na, Byung-Keun; Chang, Hong-Young, PHYSICS OF PLASMAS, v.15, 2008-12

8
Study on CH4 dry reforming process by high power inductively coupled plasma torch at atmospheric pressure

Song, Hohyun; Lee, Yun-Seong; Kwak, Geunjae; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.20, no.1, pp.196 - 204, 2020-01

9
The characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton

Lee, H. S.; Lee, Yun-Seong; Seo, S. H.; Chang, Hong-Young, THIN SOLID FILMS, v.519, pp.6955 - 6959, 2011-08

10
The discharge condition to enhance electron density of capacitively coupled plasma with multi-holed electrode

Lee, Hun-Su; Lee, Yun-Seong; Chang, Hong-Young, PHYSICS OF PLASMAS, v.19, no.9, 2012-09

11
The trend of electron temperature and electron density in the process of microcrystalline silicon solar cells

Lee, Yun-Seong; In, Jung-Hwan; Ahn, Seung-Kyu; Seo, Sang-Hun; Chang, Hong-Young; You, Dong-Joo; Ahn, Seh-Won; et al, CURRENT APPLIED PHYSICS, v.10, pp.S234 - S236, 2010-03

12
박막형 실리콘 태양전지 증착을 위한 대면적 고속 증착장비 연구 = Study on the VHF multi-electrode CCP for the microcrystalline silicon thin film solar cellslink

이윤성; Lee, Yun-Seong; et al, 한국과학기술원, 2013

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