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Showing results 1 to 7 of 7

1
Characterization of an inductively coupled Cl2/Ar plasma and its application to Cu etching

Seo, SH; Kim, JH; Lee, PW; Chang, Hong-Young, The Electrochemical society meeting, The Electrochemical Society, 1995

2
Determination of the Relative F Concentration and its Radial Profile by Plasma Parameter Normalization in and Electron cyclotron Resonance SF6/Ar Discharge

Kim, YJ; Lee, PW; Chang, Hong-Young, ECS Meeting , The electrochemical society, 1995

3
Interpretation of neutral distribution through spatial profile of plasma emission

Lee, PW; Chang, Hong-Young, PHYSICS LETTERS A, v.213, no.3-4, pp.186 - 190, 1996-04

4
Mach probe in electron cyclotron resonance plasma

Chang, Hong-Young; Lee, PW, 2nd APCPST, APCPST, 1995

5
Real Time Intrusive Optical emission spectroscopy for process control

Lee, PW; Kim, YJ; Seo, SH; Kim, JH; Chang, Hong-Young, , 1995

6
Study of Helicon Wave Plasma Production and Its Characteristics

Kim, JH; Seo, SH; Kim, YJ; Lee, PW; Chang, Hong-Young, 2nd APCPST, APCPST, 1994

7
Undriven periodic plasma oscillation in electron cyclotron resonance Ar plasma

Lee, PW; Lee, SW; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.69, no.14, pp.2024 - 2026, 1996-09

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