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Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06 |
Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06 |
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