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Nonlocal electron kinetics in a planar inductive helium discharge Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11 |
Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source S. S. Kim; S. Hamaguchi; N. S. Yoon; Chang, Choong-Seock; Y. D. Lee; S. H. Ku, PHYSICS OF PLASMAS, v.8, no.4, pp.1384 - 1394, 2001-04 |
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