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Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06 |
Three-step decay of the plasma density near the substrate in pulsed-dc magnetron sputtering discharge In, Jung Hwan; Na, Byung Keun; Seo, SH; Chang, Hong-Young; Han, JG, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.18, 2009-11 |
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