실리콘 단결정 Substrate 에서 $Al_2O_3$ 화학증착층의 핵생성 및 결정 성장에 관한 연구A study of nucleation and crystal growth in the chemical vapor deposition of $Al_2O_3$ onto silicon single crystal

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Seong-Sun-
dc.contributor.author최성우-
dc.contributor.authorChoi, Sung-Woo-
dc.date.accessioned2011-12-15T01:51:57Z-
dc.date.available2011-12-15T01:51:57Z-
dc.date.issued1983-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=63937&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51945-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1983.2, [ [iii], 62 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.title실리콘 단결정 Substrate 에서 $Al_2O_3$ 화학증착층의 핵생성 및 결정 성장에 관한 연구-
dc.title.alternativeA study of nucleation and crystal growth in the chemical vapor deposition of $Al_2O_3$ onto silicon single crystal-
dc.typeThesis(Master)-
dc.identifier.CNRN63937/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000811282-
dc.contributor.localauthor천성순-
dc.contributor.localauthorChun, Seong-Sun-
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