증착조건이 Si 증착속도 및 증착층의 표면형상에 미치는 영향에 대한 연구Effect of deposition conditionson the deposition rate and the crystal morphology of silicon deposit

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Sung-Soon-
dc.contributor.author조준형-
dc.contributor.authorCho, Joon-Hyoung-
dc.date.accessioned2011-12-15T01:51:54Z-
dc.date.available2011-12-15T01:51:54Z-
dc.date.issued1983-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=63934&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51942-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1983.2, [ [iv], 60 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectSurface reaction.-
dc.subject표면 반응.-
dc.subject열적 활성화 과정.-
dc.title증착조건이 Si 증착속도 및 증착층의 표면형상에 미치는 영향에 대한 연구-
dc.title.alternativeEffect of deposition conditionson the deposition rate and the crystal morphology of silicon deposit-
dc.typeThesis(Master)-
dc.identifier.CNRN63934/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000811267-
dc.contributor.localauthor천성순-
dc.contributor.localauthorChun, Sung-Soon-
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MS-Theses_Master(석사논문)
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