DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Kim, Jin-Baek | - |
dc.contributor.advisor | 김진백 | - |
dc.contributor.author | Kwoen, Young-Gil | - |
dc.contributor.author | 권영길 | - |
dc.date.accessioned | 2011-12-15T01:45:58Z | - |
dc.date.available | 2011-12-15T01:45:58Z | - |
dc.date.issued | 1997 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=113328&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/51581 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 신소재공학과, 1997.2, [ viii, 103 p. ] | - |
dc.description.abstract | Top surface imaging(TSI) has been utilized as a method for attaining high resolution with many advantages. TSI through gas phase silylation has been investigated by others but the ease by which liquid phase silylation can be carried out may make it an attractive alterative to gas phase silylation. The novel silicon incorporation process was studied for liquid phase process. This novel process to incorporate silicon component into resist polymer involves treatment of the resist-coated wafer with aqueous solution of silicone-oil/cationic surfactant prior to dry development by $O_2$ reactive ion etching($O_2$-RIE). The effectiveness of the silicone-oil/cationic surfactant aqueous solution(SSAS) treatment is dependent on a number of factors including structure and characteristics of resist polymer, concentration of surfactant and silicone-oil, mode and duration of SSAS treatment, and pH of the solution. The mechanism of the process has been investigated and the results suggest that the critical driving force of cationic surfactant adsorption is the coulombic force between cationic surfactant and carboxyl acid functional group in exposed area and then by hydrophobic effect, silicone-oil incorporates into inter-bilayer region. | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | Silicone oil | - |
dc.subject | Dry development | - |
dc.subject | Adsorption | - |
dc.subject | Top surface imaging | - |
dc.subject | Photolithography | - |
dc.subject | 광미세가공 | - |
dc.subject | 실리콘 오일 | - |
dc.subject | 건식현상 | - |
dc.subject | 흡착 | - |
dc.subject | 표면이미징 | - |
dc.title | (A) study on novel top surface imaging by selective adsorption of silicon-compounds | - |
dc.title.alternative | 실리콘 화합물의 선택적 흡착에 의한 새로운 표면 이미징에 관한 연구 | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 113328/325007 | - |
dc.description.department | 한국과학기술원 : 신소재공학과, | - |
dc.identifier.uid | 000957002 | - |
dc.contributor.localauthor | Kwoen, Young-Gil | - |
dc.contributor.localauthor | 권영길 | - |
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