학위논문(석사) - 한국과학기술원 : 신소재공학과, 1997.2, [ viii, 84 p. ]
Poly[N-p-(tert-butoxycarbonyloxy)phenyl dimethacrylamide]; Self-development photoresist; Chemically amplified resist; Photolithography; Cyclopolymerization; 고리화중합; 자발현상성 포토레지스트; 폴리[N-파라-(터셔리-부톡시카르보닐옥시)페닐 디메타크릴아미드]; 화학증폭형 레지스트; 광미세가공
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.