Aluminium oxide 박막의 reactive ion etching 특성A study on the reactive ion etching properties of aluminium oxide thin films

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Soung-Soon-
dc.contributor.author김재환-
dc.contributor.authorKim, Jae-Whan-
dc.date.accessioned2011-12-15T01:42:56Z-
dc.date.available2011-12-15T01:42:56Z-
dc.date.issued1992-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=60417&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51393-
dc.description학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1992.2, [ [iii], 64 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.titleAluminium oxide 박막의 reactive ion etching 특성-
dc.title.alternativeA study on the reactive ion etching properties of aluminium oxide thin films-
dc.typeThesis(Master)-
dc.identifier.CNRN60417/325007-
dc.description.department한국과학기술원 : 전자재료공학과, -
dc.identifier.uid000901104-
dc.contributor.localauthor천성순-
dc.contributor.localauthorChun, Soung-Soon-
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