CVD Cu 박막의 특성에 열처리 온도가 미치는 영향The effects of the annealed temperature on properties of CVD Cu films

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Soung-Soon-
dc.contributor.author민재식-
dc.contributor.authorMin, Jae-Sik-
dc.date.accessioned2011-12-15T01:40:51Z-
dc.date.available2011-12-15T01:40:51Z-
dc.date.issued1995-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=99489&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51266-
dc.description학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1995.2, [ iii, 63 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectChemical vapor deposition-
dc.titleCVD Cu 박막의 특성에 열처리 온도가 미치는 영향-
dc.title.alternativeThe effects of the annealed temperature on properties of CVD Cu films-
dc.typeThesis(Master)-
dc.identifier.CNRN99489/325007-
dc.description.department한국과학기술원 : 전자재료공학과, -
dc.identifier.uid000933180-
dc.contributor.localauthor민재식-
dc.contributor.localauthorMin, Jae-Sik-
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MS-Theses_Master(석사논문)
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