ECR 플라즈마 기상화학증착법에 의한 초고집적 회로의 기억소자용 탄탈륨 산화 박막의 제조 및 특성에 관한 연구A study on the tantalum oxide dielectric thin films for memory devices of ULSI by electron cyclotron resonance plasma enhanced chemical vapor deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이원종 | - |
| dc.contributor.advisor | Lee, Won-Jong | - |
| dc.contributor.author | 김종석 | - |
| dc.contributor.author | Kim, Jong-Seok | - |
| dc.date.accessioned | 2011-12-15T01:40:28Z | - |
| dc.date.available | 2011-12-15T01:40:28Z | - |
| dc.date.issued | 1993 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68567&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/51241 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 전자재료공학과, 1993.2, [ iii, 85 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | Electron cyclotron resonance plamma enhanced chemical vapor deposition. | - |
| dc.title | ECR 플라즈마 기상화학증착법에 의한 초고집적 회로의 기억소자용 탄탈륨 산화 박막의 제조 및 특성에 관한 연구 | - |
| dc.title.alternative | A study on the tantalum oxide dielectric thin films for memory devices of ULSI by electron cyclotron resonance plasma enhanced chemical vapor deposition | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 68567/325007 | - |
| dc.description.department | 한국과학기술원 : 전자재료공학과, | - |
| dc.identifier.uid | 000901112 | - |
| dc.contributor.localauthor | 김종석 | - |
| dc.contributor.localauthor | Kim, Jong-Seok | - |
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