Polycide 구조로 저압화학증착된 $WSi_x$ 박막의 열처리에 따른 거동Effects of annealing on the properties of $Si_3N_4$ films in polycide structrue formed by LPCVD method
- Advisors
- 임호빈researcher; Im, Ho-Binresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1989
- Identifier
- 67012/325007 / 000871325
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1989.2, [ [iii], 49 p. ]
- Keywords
Low-pressure chemical vapor deposition.
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.