플라즈마 화학증착법에 의한 Ti(C,N)의 증착기구 및 증착층의 특성에 관한 연구A study on the deposition mechanism and structural properties of Ti(C,N) deposited by plasma enhanced chemical vapor deposition

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dc.contributor.advisor남수우-
dc.contributor.advisorNam, Soo-Woo-
dc.contributor.author김상호-
dc.contributor.authorKim, Sang-Ho-
dc.date.accessioned2011-12-15T01:38:50Z-
dc.date.available2011-12-15T01:38:50Z-
dc.date.issued1989-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=66993&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51140-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1989.2, [ iv, 80 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject증착 변수.-
dc.title플라즈마 화학증착법에 의한 Ti(C,N)의 증착기구 및 증착층의 특성에 관한 연구-
dc.title.alternativeA study on the deposition mechanism and structural properties of Ti(C,N) deposited by plasma enhanced chemical vapor deposition-
dc.typeThesis(Master)-
dc.identifier.CNRN66993/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000871066-
dc.contributor.localauthor남수우-
dc.contributor.localauthorNam, Soo-Woo-
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MS-Theses_Master(석사논문)
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