비정질 $Si_3N_4$ 박막의 화학증착과 계면전하 특성에 관한 연구A study on chemical vapor deposition of amorphous $Si_3N_4$ thin film and the characteristics of interface charge

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dc.contributor.advisor천성순-
dc.contributor.advisorChun, Sung-Soon-
dc.contributor.author박흥락-
dc.contributor.authorPark, Heung-Lak-
dc.date.accessioned2011-12-15T01:37:07Z-
dc.date.available2011-12-15T01:37:07Z-
dc.date.issued1986-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=65409&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/51033-
dc.description학위논문(석사) - 한국과학기술원 : 재료공학과, 1986.2, [ [iii], 55 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectSurface reactions.-
dc.title비정질 $Si_3N_4$ 박막의 화학증착과 계면전하 특성에 관한 연구-
dc.title.alternativeA study on chemical vapor deposition of amorphous $Si_3N_4$ thin film and the characteristics of interface charge-
dc.typeThesis(Master)-
dc.identifier.CNRN65409/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000841136-
dc.contributor.localauthor천성순-
dc.contributor.localauthorChun, Sung-Soon-
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MS-Theses_Master(석사논문)
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