고집적 FRAM용 LSCO/Ir/TaSiN 하부전극의 안정성에 관한 연구Stability of TaSiN diffusion barrier with LSCO/Ir hybrid bottom electrode for FRAM application
- Advisors
- 김호기researcher; Kim, Hi-Giresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2001
- Identifier
- 165562/325007 / 000993074
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 2001.2, [ iv, 77 p. ]
- Keywords
확산방지막; TaSiN; LSCO; Barrier
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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