DC magnetron sputtering법을 이용한 Ir 하부전극의 형성 및 특성평가와 $(Ba,Sr)TiO_3$ 박막의 특성 평가Preparation and characterization of iridium bottom electrode by DC magnetron sputtering and characterization of $(Ba,Sr)TiO_3$ thin film
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김호기 | - |
| dc.contributor.advisor | Kim, Ho-Gi | - |
| dc.contributor.author | 박정호 | - |
| dc.contributor.author | Park, Jeong-Ho | - |
| dc.date.accessioned | 2011-12-15T01:31:14Z | - |
| dc.date.available | 2011-12-15T01:31:14Z | - |
| dc.date.issued | 1998 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=133545&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50675 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1998.2, [ 91 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | Ir bottom electrode | - |
| dc.subject | DC magnetron sputtering | - |
| dc.subject | BST | - |
| dc.subject | I-V | - |
| dc.subject | C-V | - |
| dc.subject | Different substrates | - |
| dc.title | DC magnetron sputtering법을 이용한 Ir 하부전극의 형성 및 특성평가와 $(Ba,Sr)TiO_3$ 박막의 특성 평가 | - |
| dc.title.alternative | Preparation and characterization of iridium bottom electrode by DC magnetron sputtering and characterization of $(Ba,Sr)TiO_3$ thin film | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 133545/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000963260 | - |
| dc.contributor.localauthor | 김호기 | - |
| dc.contributor.localauthor | Kim, Ho-Gi | - |
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- MS-Theses_Master(석사논문)
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