급속열산화법을 이용한 게이트용 산화막 성장기구에 관한 연구Kinetics of rapid thermal oxidation of silicon
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 강상원 | - |
| dc.contributor.advisor | Kang, Sang-Won | - |
| dc.contributor.author | 심규찬 | - |
| dc.contributor.author | Shim, Kew-Chan | - |
| dc.date.accessioned | 2011-12-15T01:30:02Z | - |
| dc.date.available | 2011-12-15T01:30:02Z | - |
| dc.date.issued | 1996 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=106615&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50603 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1996.2, [ 51 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 급속열산화 | - |
| dc.subject | 성장기구 | - |
| dc.subject | 산화 | - |
| dc.subject | Oxidation | - |
| dc.subject | RTO | - |
| dc.subject | Kinetics | - |
| dc.title | 급속열산화법을 이용한 게이트용 산화막 성장기구에 관한 연구 | - |
| dc.title.alternative | Kinetics of rapid thermal oxidation of silicon | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 106615/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000943304 | - |
| dc.contributor.localauthor | 강상원 | - |
| dc.contributor.localauthor | Kang, Sang-Won | - |
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