플라즈마 화학증착법에 의하여 증착된 Aluminum oxide 박막의 에칭 특성에 관한 연구A study on etching properties of aluminum oxide films deposited by plasma enhanced chemical vapor deposition
- Advisors
- 천성순researcher; Chun, Soung-Soonresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1991
- Identifier
- 68061/325007 / 000891464
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 재료공학과, 1991.2, [ [iv], 85 p. ]
- Appears in Collection
- MS-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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