저압화학증착법에 의한 $TiO_2$ 박막의 제조와 반응변수에 따른 증착 및 C-V 특성The fabrication of the $TiO_2$ thin film by low pressure chemical vapor deposition and the effect of the reaction parameters on the deposition and C-V characteristics
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김호기 | - |
| dc.contributor.advisor | Kim, Ho-Gi | - |
| dc.contributor.author | 원태경 | - |
| dc.contributor.author | Won, Tai-Kyung | - |
| dc.date.accessioned | 2011-12-15T01:27:51Z | - |
| dc.date.available | 2011-12-15T01:27:51Z | - |
| dc.date.issued | 1991 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68044&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/50468 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1991.2, [ iii, 96 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | Capacitance-voltage measurement. | - |
| dc.title | 저압화학증착법에 의한 $TiO_2$ 박막의 제조와 반응변수에 따른 증착 및 C-V 특성 | - |
| dc.title.alternative | The fabrication of the $TiO_2$ thin film by low pressure chemical vapor deposition and the effect of the reaction parameters on the deposition and C-V characteristics | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 68044/325007 | - |
| dc.description.department | 한국과학기술원 : 재료공학과, | - |
| dc.identifier.uid | 000891296 | - |
| dc.contributor.localauthor | 김호기 | - |
| dc.contributor.localauthor | Kim, Ho-Gi | - |
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