$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN films

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dc.contributor.advisor이원종-
dc.contributor.advisorLee, Won-Jong-
dc.contributor.author장성수-
dc.contributor.authorJang, Seong-Soo-
dc.date.accessioned2011-12-15T01:06:49Z-
dc.date.available2011-12-15T01:06:49Z-
dc.date.issued2001-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165737&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50410-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ ix, 127 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject기상화학증착-
dc.subject타이타늄 나이트라이드-
dc.subject타이타늄-
dc.subject유도결합플라즈마-
dc.subject플라즈마-
dc.subjectplasma-
dc.subjectCVD-
dc.subjectTiN-
dc.subjectTi-
dc.subjectinductively coupled plasma-
dc.title$H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구-
dc.title.alternativeInvestigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN films-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN165737/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000955326-
dc.contributor.localauthor장성수-
dc.contributor.localauthorJang, Seong-Soo-
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