DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 이원종 | - |
dc.contributor.advisor | Lee, Won-Jong | - |
dc.contributor.author | 장성수 | - |
dc.contributor.author | Jang, Seong-Soo | - |
dc.date.accessioned | 2011-12-15T01:06:49Z | - |
dc.date.available | 2011-12-15T01:06:49Z | - |
dc.date.issued | 2001 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165737&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/50410 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ ix, 127 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | 기상화학증착 | - |
dc.subject | 타이타늄 나이트라이드 | - |
dc.subject | 타이타늄 | - |
dc.subject | 유도결합플라즈마 | - |
dc.subject | 플라즈마 | - |
dc.subject | plasma | - |
dc.subject | CVD | - |
dc.subject | TiN | - |
dc.subject | Ti | - |
dc.subject | inductively coupled plasma | - |
dc.title | $H_2/Ar/TiCl_4$ 및 $N_2/H_2/Ar/TiCl_4$ 유도결합 플라즈마 CVD 법에 의한 Ti 및 TiN 박막의 증착 특성 연구 | - |
dc.title.alternative | Investigation of the $H_2/Ar/TiCl_4$ and $N_2/H_2/Ar/TiCl_4$ inductively coupled plasma enhanced CVD system for the deposition of Ti and TiN films | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 165737/325007 | - |
dc.description.department | 한국과학기술원 : 재료공학과, | - |
dc.identifier.uid | 000955326 | - |
dc.contributor.localauthor | 장성수 | - |
dc.contributor.localauthor | Jang, Seong-Soo | - |
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