플라즈마 화학 증착법으로 제조된 실리콘 산화물 박막의 대기중 응력 변화 거동에 관한 연구A study on the stress behavior in plasma-enhanced chemical vapor deposited silicon dioxide films exposed to air
- Advisors
- 이재영; Lee, Jai-Young
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2000
- Identifier
- 157696/325007 / 000955138
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2000.2, [ v, 127 p. ]
- Keywords
응력; 실리콘 산화막; 수소; Hydrogen; Stress; Silicon oxide
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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