DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 이정용 | - |
dc.contributor.advisor | Lee, Jeong-Yong | - |
dc.contributor.author | 권명석 | - |
dc.contributor.author | Kwon, Myoung-Seok | - |
dc.date.accessioned | 2011-12-15T01:05:45Z | - |
dc.date.available | 2011-12-15T01:05:45Z | - |
dc.date.issued | 1999 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=150157&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/50347 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 재료공학과, 1999.2, [ ix, 102 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | Reaction mechanism | - |
dc.subject | Reaction characteristics | - |
dc.subject | Dry etching | - |
dc.subject | Reactive plasma | - |
dc.subject | Cu | - |
dc.subject | 반응 기구 | - |
dc.subject | 반응 특성 | - |
dc.subject | 반응성 플라즈마 | - |
dc.subject | 건식 식각 | - |
dc.subject | 구리 | - |
dc.title | 구리 박막과 반응성 플라즈마의 건식 식각반응 특성에 관한 연구 | - |
dc.title.alternative | A study on the characteristics of dry etch reactions between Cu thin film and reactive plasmas | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 150157/325007 | - |
dc.description.department | 한국과학기술원 : 재료공학과, | - |
dc.identifier.uid | 000945025 | - |
dc.contributor.localauthor | 권명석 | - |
dc.contributor.localauthor | Kwon, Myoung-Seok | - |
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