$NiCl_2$ 및 마이크로웨이브 가열을 이용한 비정질 Si 박막의 저온결정화에 관한 연구Low temperature crystallization amorphous Si thin films using $NiCl_2$ and microwave heating

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Advisors
안병태researcherAhn, Byung-Taeresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2002
Identifier
174587/325007 / 000985209
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.2, [ v, 144 p. ]

Keywords

마이크로웨이브; 실리콘; 결정화; 박막트랜지스터; TFT; microwave; Si; Crystallization

URI
http://hdl.handle.net/10203/50247
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=174587&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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