(A) study on the contact damage in silicon nitride bilayer질화규소 이층 층상재료의 접촉하중에 의한 손상거동 연구
- Advisors
- Kim, Do-Kyungresearcher; 김도경researcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1998
- Identifier
- 143465/325007 / 000955254
- Language
- eng
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1998.8, [ xix, 211 p. ]
- Keywords
Damage tolerance; Hertzian indentation; Bilayer; Contact damage; Silicon nitride; 질화규소; 손상저항성; 구형압자 압흔법; 이층 층상재료; 접촉손상
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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