RFreactive sputtering법으로 제조한 탄성표면파 소자용 AlN:H 박막과 ZnO/AlN 이층박막의 특성에 관한 연구A study on the properties of AlN:H thin films and ZnO/AlN bilayered films prepared by RF reactive sputtering for the application of SAW devices

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dc.contributor.advisor이재영-
dc.contributor.advisorLee, Jai-Young-
dc.contributor.author용윤중-
dc.contributor.authorYong, Yoon-Joong-
dc.date.accessioned2011-12-15T01:03:04Z-
dc.date.available2011-12-15T01:03:04Z-
dc.date.issued1997-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=128166&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50186-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 1997.8, [ v, 133 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject탄성표면파-
dc.subject산화아연/질화알루미늄-
dc.subject수소화된 질화알루미늄-
dc.subject스퍼터링-
dc.subjectSputtering-
dc.subjectSAW-
dc.subjectZnO/AlN-
dc.subjectAlN:H-
dc.titleRFreactive sputtering법으로 제조한 탄성표면파 소자용 AlN:H 박막과 ZnO/AlN 이층박막의 특성에 관한 연구-
dc.title.alternativeA study on the properties of AlN:H thin films and ZnO/AlN bilayered films prepared by RF reactive sputtering for the application of SAW devices-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN128166/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000935219-
dc.contributor.localauthor용윤중-
dc.contributor.localauthorYong, Yoon-Joong-
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MS-Theses_Ph.D.(박사논문)
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