열산화 조건과 열처리 조건이 Silicon 위에 형성한 tantalum oxide 의 성질에 미치는 영향Effects of oxidation and annealing conditions on the properties of tantalum oxide films on silicon substrates

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 496
  • Download : 0
DC FieldValueLanguage
dc.contributor.advisor임호빈-
dc.contributor.advisorIm, Ho-Bin-
dc.contributor.author박성욱-
dc.contributor.authorPark, Sung-Wook-
dc.date.accessioned2011-12-15-
dc.date.available2011-12-15-
dc.date.issued1992-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=59867&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/49941-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 1992.2, [ iv, [101] p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subject산화탄탈-
dc.subjectTantalum oxides-
dc.title열산화 조건과 열처리 조건이 Silicon 위에 형성한 tantalum oxide 의 성질에 미치는 영향-
dc.title.alternativeEffects of oxidation and annealing conditions on the properties of tantalum oxide films on silicon substrates-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN59867/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000825110-
dc.contributor.localauthor박성욱-
dc.contributor.localauthorPark, Sung-Wook-
Appears in Collection
MS-Theses_Ph.D.(박사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0