Microstructural and electrical characteristics of indium-antimony-tellurium chalcogenide alloys for application in phase change memory상변화 메모리 응용을 위한 InSbTe 칼코게나이드 화합물의 미세구조와 전기적 특성에 관한 연구

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 544
  • Download : 0
Ge-Sb-Te ternary alloys have been widely investigated as a phase change material for the phase change nonvolatile memory (PRAM) since they show a reversible transformation between the amorphous and crystalline states, a fast crystallization rate, and a long retention time. Particularly, the $Ge_2Sb_2Te_5$ (GST) alloy has been studied intensively because it has the best conditions to apply to memory devices. Although, the GST is widely known as phase change material, there are several problems such as instability of amorphous state due to low crystallization temperature, high melting temperature and insufficient multi-bit storage capability. To occupy the competitive advantage of PRAM compared to other memory devices, these problems should be overcome. Therefore, many attempts have been made to develop non-GST phase change materials by design the chalcogenide materials. Based on this point, the $In_3Sb_1Te_2$ (IST) alloy was focused on in this study. Actually, the IST has same atomic structure (S.G. $\sharp225$, Fm-3m) and it has nearly same lattice spacing (a=b=c=6.12 $\Aring$) compared with that of the GST (a=b=c=6.03 $\Aring$). In addition, The IST has already known as the optical data storage material. Furthermore, in a recent study, it is revealed that the IST-GST system shows high phase change temperature compared with that of the GST system. Therefore, it is necessary to investigate a possibility of the IST ternary alloys for the application in PRAM. This thesis reports the microstructure and electrical characteristics of the IST ternary alloy for application in PRAM. To investigate its electrical characteristics, PRAM devices were fabricated using the IST and GST ternary alloy. The device had a simple layered structure (bottom electrode/IST/top electrode). The contact region between the bottom electrode and phase change materials was fabricated by the Focused Ion Beam (FIB) method. Reset pulse was generated with Agilent B1101A pulse generator and the c...
Advisors
Lee, Jeong-Yongresearcher이정용researcher
Description
한국과학기술원 : 신소재공학과,
Publisher
한국과학기술원
Issue Date
2010
Identifier
455398/325007  / 020065041
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 신소재공학과, 2010.08, [ xvii, 170 p. ]

Keywords

GeSbTe Chalcogenide Alloy; InSbTe Chalcogenide Alloy; Phase Change Memory; Transmission Electron Microscopy; 투과전자현미경; 져머늄 안티몬 텔러륨 6족 화합물; 인듐 안티몬 텔러륨 6족 화합물; 상변화메모리

URI
http://hdl.handle.net/10203/49875
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=455398&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0