비교란 탐침을 이용한 RF 유도플라즈마에서의 전기장 측정Electric field measurement in an inductively coupled plasma by a non-disturbing probe

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Advisors
이순칠researcherLee, Soon-Chilresearcher
Description
한국과학기술원 : 물리학과,
Publisher
한국과학기술원
Issue Date
1997
Identifier
112634/325007 / 000953455
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 물리학과, 1997.2, [ [ii], 38 p. ]

Keywords

비교란 탐침; 압전공명; 유도결합 플라즈마; Inductively coupled plasma; Non disturbing probe; Piezoelectric resonance

URI
http://hdl.handle.net/10203/48433
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=112634&flag=dissertation
Appears in Collection
PH-Theses_Master(석사논문)
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