RF 글로우 방전에 의한 boron 및 phosphorous 가 도핑된 미세결정 규소의 제작에 관한 연구Fabrication of boron and phosphorous doped microcrystalline silicon by RF glow discharge method

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dc.contributor.advisor이주천-
dc.contributor.advisorLee, Choo-Chon-
dc.contributor.author이왕주-
dc.contributor.authorLee, Wang-Joo-
dc.date.accessioned2011-12-14T07:50:22Z-
dc.date.available2011-12-14T07:50:22Z-
dc.date.issued1988-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=66113&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/48191-
dc.description학위논문(석사) - 한국과학기술원 : 물리학과, 1988.2, [ ii, 27 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.titleRF 글로우 방전에 의한 boron 및 phosphorous 가 도핑된 미세결정 규소의 제작에 관한 연구-
dc.title.alternativeFabrication of boron and phosphorous doped microcrystalline silicon by RF glow discharge method-
dc.typeThesis(Master)-
dc.identifier.CNRN66113/325007-
dc.description.department한국과학기술원 : 물리학과, -
dc.identifier.uid000861318-
dc.contributor.localauthor이왕주-
dc.contributor.localauthorLee, Wang-Joo-
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PH-Theses_Master(석사논문)
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