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Results 1-10 of 204 (Search time: 0.004 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Wide memory window in graphene oxide charge storage nodes Wang, Shuai; Pu, Jing; Chan, Daniel S. H.; Cho, Byung Jin; Loh, Kian Ping, APPLIED PHYSICS LETTERS, v.96, no.14, 2010-04 | |
| Electromagnetic interference shielding effectiveness of monolayer graphene Hong, Seul Ki; Kim, Ki Yeong; Kim, Taek Yong; Kim, Jong Hoon; Park, Seong Wook; Kim, Joung Ho; Cho, Byung Jin, NANOTECHNOLOGY, v.23, no.45, 2012-11 | |
| Border-trap characterization in high-kappa strained-si MOSFETs Maji, Debabrata; Duttagupta, S. P.; Rao, V. Rarngopal; Yeo, Chia Ching; Cho, Byung Jin, IEEE ELECTRON DEVICE LETTERS, v.28, no.8, pp.731 - 733, 2007-08 | |
| MOS characteristics of synthesized HfAlON-HfO2 stack using AIN-HfO2 Park, CS; Cho, Byung Jin; Kwong, DL, IEEE ELECTRON DEVICE LETTERS, v.25, no.9, pp.619 - 621, 2004-09 | |
| Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures Chen, XY; Lu, YF; Wu, YH; Cho, Byung Jin; Song, WD; Dai, DY, JOURNAL OF APPLIED PHYSICS, v.96, no.6, pp.3180 - 3186, 2004-09 | |
| Hafnium aluminum oxide as charge storage and blocking-oxide layers in SONOS-type nonvolatile memory for high-speed operation Tan, YN; Chim, WK; Choi, WK; Joo, MS; Cho, Byung Jin, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.53, no.4, pp.654 - 662, 2006-04 | |
| Improvement of thermoelectric properties of screen-printed Bi2Te3 thick film by optimization of the annealing process We, Ju Hyung; Kim, Sun Jin; Kim, Gyung Soo; Cho, Byung Jin, JOURNAL OF ALLOYS AND COMPOUNDS, v.552, pp.107 - 110, 2013-03 | |
| Determination of Work Function of Graphene under a Metal Electrode and Its Role in Contact Resistance Song, Seung Min; Park, Jong Kyung; Sul, One Jae; Cho, Byung Jin, NANO LETTERS, v.12, no.8, pp.3887 - 3892, 2012-08 | |
| Improvement of Charge Retention in Flash Memory Devices by Very Light Doping of Lanthanum into an Aluminum-Oxide Blocking Layer Park, Jong Kyung; Lee, Seok-Hee; Oh, Jae Sub; Lee, Ki-Hong; Pyi, Seung Ho; Cho, Byung Jin, APPLIED PHYSICS EXPRESS, v.5, no.8, 2012-08 | |
| Reduction of charge trapping in HfO2 film on a Ge substrate by trimethylaluminum pretreatment Lee, Jae Jin; Shin, Yunsang; Choi, Juyun; Kim, Hyoungsub; Hyun, Sangjin; Choi, Siyoung; Cho, Byung Jin; Lee, Seok-Hee, PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.6, no.11, pp.439 - 441, 2012-11 |
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