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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Extremely scaled silicon nano-CMOS devices Chang, LL; Choi, Yang-Kyu; Ha, DW; Ranade, P; Xiong, SY; Bokor, J; Hu, CM; King, TJ, PROCEEDINGS OF THE IEEE, v.91, no.11, pp.1860 - 1873, 2003-11 | |
| A spacer patterning technology for nanoscale CMOS Choi, Yang-Kyu; King, TJ; Hu, CM, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.49, no.3, pp.436 - 441, 2002-03 | |
| Sub-60-nm quasi-planar FinFETs fabricated using a simplified process Lindert, N; Chang, LL; Choi, Yang-Kyu; Anderson, EH; Lee, WC; King, TJ; Bokor, J; Hu, CM, IEEE ELECTRON DEVICE LETTERS, v.22, no.10, pp.487 - 489, 2001-10 | |
| Demonstration of a Curable Nanowire FinFET Using Punchthrough Current to Repair Hot-Carrier Damage Park, Jun-Young; Hur, Jae; Choi, Yang-Kyu, IEEE ELECTRON DEVICE LETTERS, v.39, no.2, pp.180 - 183, 2018-02 |
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