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Boron profile narrowing in laser-processed silicon after rapid thermal anneal Poon, CH; Tan, LS; Cho, Byung Jin; See, A; Bhat, M, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.1, pp.80 - 83, 2004-01 |
Dopant loss mechanism in n(+)/p germanium junctions during rapid thermal annealing Poon, CH; Tan, LS; Cho, Byung Jin; Du, AY, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.152, no.12, pp.895 - 899, 2005-10 |
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