Browse "EE-Journal Papers(저널논문)" by Type Article
Showing results 3601 to 3620 of 14178
| Characteristics of a wall voltage during sustain period in AC plasma display panels Shin, BJ; Choi, Kyung Cheol; Whang, KW, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.33, pp.964 - 968, 2005-04 |
| Characteristics of AlGaAs/InGaAs/GaAs pseudomorphic HEMTs with wide head T-shaped gate fabricated by optimized dose split E-beam lithography Lee, JH; Yoon, HS; Choi, SS; Park, Chul Soon; Pyun, KE; Park, HM, COMPOUND SEMICONDUCTORS 1995, v.145, pp.809 - 812, 1996-01 |
| Characteristics of an address discharge in ac plasma display panels Shin, BJ; Choi, Kyung Cheol; Tae, HS; Park, SS, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.33, pp.1426 - 1430, 2005-08 |
| Characteristics of an area-variable varactor diode Kim, DW; Lee, JJ; Kwon, YS; Hong, Songcheol, IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, v.44, no.11, pp.2053 - 2057, 1996-11 |
| Characteristics of charged and metastable species in micro-discharges of AC-plasma display panel Choi, Kyung Cheol; Rhee, BJ; Lee, HN, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.31, pp.329 - 332, 2003-06 |
| Characteristics of ferroelectric transistors with BaMgF4 dielectric Lyu, Jong-Son; Jeong, Jin-Woo; Kim, Kwang-Ho; Kim, Bo-Woo; Yoo, Hyung Joun, ETRI JOURNAL, v.20, no.2, pp.241 - 249, 1998-06 |
| Characteristics of gradually doped LWIR diodes by hydrogenation Kim, Y.-H.; Kim, T.-S.; Redfern, D.A.; Musca, C.A.; Lee, Hee Chul; Kim, Choong Ki, JOURNAL OF ELECTRONIC MATERIALS, v.29, no.6, pp.859 - 864, 2000-06 |
| Characteristics of hetero-structured thermoelectric devices with a-Si/Mg2Si-stacked thin film layers Lee, Ji Hwa; Ha, Jae Kwon; Piyapatarakul, Tipat; Yoon, Chongsei; Jeon, Buil; Giwan Yoon, ELECTRONICS LETTERS, v.54, no.24, pp.1399 - 1401, 2018-11 |
| Characteristics of indium bump for flip-chip bonding used in polymeric-waveguide-integrated optical interconnection systems Chu, KM; Lee, JS; Cho, HS; Rho, BS; Park, HyoHoon; Jeon, DukYoung, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.8B, pp.5922 - 5927, 2004-08 |
| Characteristics of piezoelectric ZnO/AlN-stacked flexible nanogenerators for energy harvesting applications Lee, Eunju; Park, Jaedon; Yim, Munhyuk; Kim, Yeong Seon; Yoon, Giwan, APPLIED PHYSICS LETTERS, v.106, no.2, 2015-01 |
| Characteristics of polymer waveguide notch filters using thermooptic long-period gratings Kwon, MS; Shin, Sang Yung, IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, v.11, no.1, pp.190 - 196, 2005-01 |
| Characteristics of silicon nanocrystal floating gate memory using amorphous carbon/SiO2 tunnel barrier Baik, SJ; Lim, Koeng Su, APPLIED PHYSICS LETTERS, v.81, pp.5186 - 5188, 2002-12 |
| Characteristics of stereo images from detectors in focal plane array Son, Jung-Young; Yeom, Seokwon; Chun, Joohwan; Guschin, Vladmir P.; Lee, Dong-Su, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, v.28, no.7, pp.1482 - 1488, 2011-07 |
| Characteristics of tunneling nitride grown by electron cyclotron resonance nitrogen plasma nitridation and its application to low voltage EEPROM kyeong-sik min; jin-yong chung; Lee, Kwyro, JAPANESE JOURNAL OF THE APPLIED PHYSICS, v.40, no.4b, pp.2693 - 2698, 2001-04 |
| Characteristics of tunneling nitride grown by electron cyclotron resonance nitrogen-plasma nitridation and its application to low-voltage electrical erasable-programmable read-only memory Min, KS; Chung, JY; Lee, Kwyro, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.40, no.4B, pp.2963 - 2968, 2001-04 |
| Characterization and Analysis of Deep Learning for 3D Point Cloud Analytics Hyun, Bongjoon; Lee, Jiwon; Rhu, Minsoo, IEEE COMPUTER ARCHITECTURE LETTERS, v.20, no.2, pp.106 - 109, 2021-07 |
| Characterization and optimization of partially depleted SOI MOSFETs for high power RF switch applications Im, Donggu; Lee, Kwyro, SOLID-STATE ELECTRONICS, v.90, pp.94 - 98, 2013-12 |
| Characterization and removal of silicon surface residue resulting from CHF3/C2F6 reactive ion etching Park, Sin Chong, JOURNAL OF APPLIED PHYSICS, v.76, no.8, pp.4596 - 4602, 1994-01 |
| Characterization and removal of trace heavy metal contamination on Si-surface resulted from CHF3/C2F6 reactive ion etching Lee, Chun Su; Kang, Seung Yul; Woo, Seong-Ihl; Baek, Jong Tae; Yoo, Hyung Joun, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.4A, pp.2096 - 2100, 1997-04 |
| Characterization of anhydrous HF gas-phase etching with CH3OH for sacrificial oxide removal Lee, JH; Jang, WI; Lee, CS; Il Lee, Y; Choi, CA; Baek, JT; Yoo, Hyung Joun, SENSORS AND ACTUATORS A-PHYSICAL, v.64, no.1, pp.27 - 32, 1998-01 |
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