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FinFET Process Refinements for Improved Mobility and Gate Work Function Engineering

Choi, Yang-Kyu; Chang, Leland; Ranade, Pushkar; Lee, Jeong-Soo; Ha, Daewon; Balasubramanian, Sriram; Agarwal, Aditya; et al, IEEE IEDM Technical Digest, pp.259 - 262, IEEE, 2002-12

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