ECR 열산화막의 특성분석 및 다결정실리콘 박막트랜지스터에의 응용Characterization of ECR thermal oxide and its application to polysilicon TFT's

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dc.contributor.advisor한철희-
dc.contributor.advisorHan, Chul-Hi-
dc.contributor.author오길환-
dc.contributor.authorOh, Kil-Hwan-
dc.date.accessioned2011-12-14T01:59:12Z-
dc.date.available2011-12-14T01:59:12Z-
dc.date.issued1993-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=68863&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/38148-
dc.description학위논문(석사) - 한국과학기술원 : 전기 및 전자공학과, 1993.2, [ [iii], 49 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.titleECR 열산화막의 특성분석 및 다결정실리콘 박막트랜지스터에의 응용-
dc.title.alternativeCharacterization of ECR thermal oxide and its application to polysilicon TFT's-
dc.typeThesis(Master)-
dc.identifier.CNRN68863/325007-
dc.description.department한국과학기술원 : 전기 및 전자공학과, -
dc.identifier.uid000911357-
dc.contributor.localauthor한철희-
dc.contributor.localauthorHan, Chul-Hi-
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EE-Theses_Master(석사논문)
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